Chemical sensitivity on patterned organic thin films by FFM

Titel in Übersetzung: Chemical sensitivity on patterned organic thin films by FFM

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

Titel in Übersetzung	Chemical sensitivity on patterned organic thin films by FFM
Originalsprache	Englisch
Publikationsstatus	Veröffentlicht - 2008
Veranstaltung	E-MRS 2008 Spring Meeting - Strasbourg, France Dauer: 26 Mai 2008 → 30 Mai 2008

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@conference{ea09d4a4c00b43ef9efe0d9beee564c9,

title = "Chemical sensitivity on patterned organic thin films by FFM",

author = "Quan Shen and Gregor Hlawacek and Christian Teichert and Alexandra Lex and Georg Trimmel and Wolfgang Kern",

year = "2008",

language = "English",

note = "E-MRS 2008 Spring Meeting ; Conference date: 26-05-2008 Through 30-05-2008",

}