Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

Ronald Schöngrundner; Ruth Treml; Thomas Antretter; Darian Kozic; Werner Ecker; Daniel Kiener

doi:10.1016/j.tsf.2014.06.003

Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

Titel in Übersetzung: Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

Ronald Schöngrundner
, Ruth Treml
, Thomas Antretter
, Darian Kozic
, Werner Ecker
, Daniel Kiener

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

39 Zitate (Scopus)

Titel in Übersetzung	Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method
Originalsprache	Englisch
Seiten (von - bis)	321-330
Fachzeitschrift	Thin solid films
DOIs	https://doi.org/10.1016/j.tsf.2014.06.003
Publikationsstatus	Veröffentlicht - 2014

Zugriff auf Dokument

10.1016/j.tsf.2014.06.003

Dieses zitieren

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title = "Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method",

author = "Ronald Sch{\"o}ngrundner and Ruth Treml and Thomas Antretter and Darian Kozic and Werner Ecker and Daniel Kiener",

year = "2014",

doi = "10.1016/j.tsf.2014.06.003",

language = "English",

pages = "321--330",

journal = "Thin solid films",

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publisher = "Elsevier B.V.",

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T1 - Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

AU - Schöngrundner, Ronald

AU - Treml, Ruth

AU - Antretter, Thomas

AU - Kozic, Darian

AU - Ecker, Werner

AU - Kiener, Daniel

PY - 2014

Y1 - 2014

U2 - 10.1016/j.tsf.2014.06.003

DO - 10.1016/j.tsf.2014.06.003

M3 - Article

SN - 0040-6090

SP - 321

EP - 330

JO - Thin solid films

JF - Thin solid films

ER -