Effects of bias pulse frequencies on reactively sputter deposited NbOx films

Effects of bias pulse frequencies on reactively sputter deposited NbO_x films

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

1 Zitat (Scopus)

@article{005e5a8de13746c28cba037a0881a7c1,

title = "Effects of bias pulse frequencies on reactively sputter deposited NbOx films",

author = "Roland Lorenz and M. O`Sullivan and Alexander Fian and D. Sprenger and Bernhard Lang and Christian Mitterer",

year = "2018",

doi = "10.1016/j.tsf.2018.06.040",

language = "English",

pages = "335--342",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Effects of bias pulse frequencies on reactively sputter deposited NbOx films

AU - Lorenz, Roland

AU - O`Sullivan, M.

AU - Fian, Alexander

AU - Sprenger, D.

AU - Lang, Bernhard

AU - Mitterer, Christian

PY - 2018

Y1 - 2018

U2 - 10.1016/j.tsf.2018.06.040

DO - 10.1016/j.tsf.2018.06.040

M3 - Article

SN - 0040-6090

SP - 335

EP - 342

JO - Thin solid films

JF - Thin solid films

ER -