Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

David Holec; Richard Rachbauer; M. Lattemann; L. Hultman; Jörg Paulitsch; Paul Heinz Mayrhofer

Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

Titel in Übersetzung: Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

David Holec, Richard Rachbauer, M. Lattemann, L. Hultman, Jörg Paulitsch, Paul Heinz Mayrhofer

Lehrstuhl für Funktionale Werkstoffe und Werkstoffsysteme (425)

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

Titel in Übersetzung	Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
Originalsprache	Englisch
Publikationsstatus	Veröffentlicht - 2012
Veranstaltung	4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials - Aichi, Japan Dauer: 4 März 2012 → 8 März 2012

Konferenz

Konferenz	4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
Land/Gebiet	Japan
Ort	Aichi
Zeitraum	4/03/12 → 8/03/12

Dieses zitieren

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title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",

author = "David Holec and Richard Rachbauer and M. Lattemann and L. Hultman and J{\"o}rg Paulitsch and Mayrhofer, {Paul Heinz}",

year = "2012",

language = "English",

note = "4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials ; Conference date: 04-03-2012 Through 08-03-2012",

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Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. / Holec, David; Rachbauer, Richard; Lattemann, M. et al.
2012. Postersitzung präsentiert bei 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

TY - CONF

T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

AU - Holec, David

AU - Rachbauer, Richard

AU - Lattemann, M.

AU - Hultman, L.

AU - Paulitsch, Jörg

AU - Mayrhofer, Paul Heinz

PY - 2012

Y1 - 2012

M3 - Poster

T2 - 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials

Y2 - 4 March 2012 through 8 March 2012

ER -