Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology

Florian Knabl; Dominik Gutnik; Prathamesh Patil; Christine Bandl; Tijmen Vermeij; Christian M. Pichler; Barbara Putz; Christian Mitterer

doi:10.1016/j.vacuum.2024.113724

Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology

Florian Knabl, Dominik Gutnik, Prathamesh Patil, Christine Bandl, Tijmen Vermeij, Christian M. Pichler, Barbara Putz, Christian Mitterer

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

Originalsprache	Englisch
Aufsatznummer	113724
Fachzeitschrift	Vacuum
Jahrgang	230
DOIs	https://doi.org/10.1016/j.vacuum.2024.113724
Publikationsstatus	Veröffentlicht - Dez. 2024

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© 2024 The Authors

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10.1016/j.vacuum.2024.113724

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title = "Enhancement of copper nanoparticle yield in magnetron sputter inert gas condensation by applying substrate bias voltage and its influence on thin film morphology",

keywords = "Low energy ion scattering spectroscopy, Magnetron sputter inert gas condensation, Magnetron sputtering, Nanoparticle synthesis, Thin film",

author = "Florian Knabl and Dominik Gutnik and Prathamesh Patil and Christine Bandl and Tijmen Vermeij and Pichler, {Christian M.} and Barbara Putz and Christian Mitterer",

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AU - Knabl, Florian

AU - Gutnik, Dominik

AU - Patil, Prathamesh

AU - Bandl, Christine

AU - Vermeij, Tijmen

AU - Pichler, Christian M.

AU - Putz, Barbara

AU - Mitterer, Christian

PY - 2024/12

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KW - Low energy ion scattering spectroscopy

KW - Magnetron sputter inert gas condensation

KW - Magnetron sputtering

KW - Nanoparticle synthesis

KW - Thin film

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DO - 10.1016/j.vacuum.2024.113724

M3 - Article

AN - SCOPUS:85206340376

SN - 0042-207X

VL - 230

JO - Vacuum

JF - Vacuum

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