Hierarchy of adhesion forces in patterns of photoreactive surface layers

Titel in Übersetzung: Hierarchy of adhesion forces in patterns of photoreactive surface layers

Gregor Hlawacek, Quan Shen, Christian Teichert, Alexandra Lex, Gregor Trimmel, Wolfgang Kern

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

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Titel in Übersetzung	Hierarchy of adhesion forces in patterns of photoreactive surface layers
Originalsprache	Englisch
Seiten (von - bis)	44703-1-44703-5
Fachzeitschrift	Journal of chemical physics (The journal of chemical physics)
Jahrgang	130
DOIs	https://doi.org/10.1063/1.3062841
Publikationsstatus	Veröffentlicht - 2009

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title = "Hierarchy of adhesion forces in patterns of photoreactive surface layers",

author = "Gregor Hlawacek and Quan Shen and Christian Teichert and Alexandra Lex and Gregor Trimmel and Wolfgang Kern",

year = "2009",

doi = "10.1063/1.3062841",

language = "English",

volume = "130",

pages = "44703--1--44703--5",

journal = "Journal of chemical physics (The journal of chemical physics)",

issn = "0021-9606",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Hierarchy of adhesion forces in patterns of photoreactive surface layers

AU - Hlawacek, Gregor

AU - Shen, Quan

AU - Teichert, Christian

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Kern, Wolfgang

PY - 2009

Y1 - 2009

U2 - 10.1063/1.3062841

DO - 10.1063/1.3062841

M3 - Article

SN - 0021-9606

VL - 130

SP - 44703-1-44703-5

JO - Journal of chemical physics (The journal of chemical physics)

JF - Journal of chemical physics (The journal of chemical physics)

ER -