High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer

René Hammer; Juraj Todt; Jozef Keckes; Bernhard Sartory; Georg Parteder; Jochen Kraft; Stefan Defregger

doi:10.1016/j.matdes.2017.06.052

High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer

René Hammer, Juraj Todt, Jozef Keckes, Bernhard Sartory, Georg Parteder, Jochen Kraft, Stefan Defregger

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

7 Zitate (Scopus)

Originalsprache	Englisch
Seiten (von - bis)	72-78
Seitenumfang	7
Fachzeitschrift	Materials and Design
Jahrgang	132.2017
Ausgabenummer	15 October
Frühes Online-Datum	23 Juni 2017
DOIs	https://doi.org/10.1016/j.matdes.2017.06.052
Publikationsstatus	Veröffentlicht - 15 Okt. 2017

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10.1016/j.matdes.2017.06.052

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title = "High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer",

keywords = "Grain size distribution, Hall-Petch, Ion beam layer removal, Nanocrystalline, Residual stress profile, Tungsten thin film",

author = "Ren{\'e} Hammer and Juraj Todt and Jozef Keckes and Bernhard Sartory and Georg Parteder and Jochen Kraft and Stefan Defregger",

year = "2017",

month = oct,

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doi = "10.1016/j.matdes.2017.06.052",

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High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer. / Hammer, René; Todt, Juraj ; Keckes, Jozef et al.
in: Materials and Design, Jahrgang 132.2017, Nr. 15 October, 15.10.2017, S. 72-78.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

TY - JOUR

T1 - High resolution residual stress gradient characterization in W/TiN-stack on Si(100)

T2 - Correlating in-plane stress and grain size distributions in W sublayer

AU - Hammer, René

AU - Todt, Juraj

AU - Keckes, Jozef

AU - Sartory, Bernhard

AU - Parteder, Georg

AU - Kraft, Jochen

AU - Defregger, Stefan

PY - 2017/10/15

Y1 - 2017/10/15

KW - Grain size distribution

KW - Hall-Petch

KW - Ion beam layer removal

KW - Nanocrystalline

KW - Residual stress profile

KW - Tungsten thin film

UR - http://www.scopus.com/inward/record.url?scp=85021677351&partnerID=8YFLogxK

U2 - 10.1016/j.matdes.2017.06.052

DO - 10.1016/j.matdes.2017.06.052

M3 - Article

AN - SCOPUS:85021677351

SN - 0264-1275

VL - 132.2017

SP - 72

EP - 78

JO - Materials and Design

JF - Materials and Design

IS - 15 October

ER -