@article{a32fe5fe2b494c26b1924bba1f8aa144,
title = "High resolution residual stress gradient characterization in W/TiN-stack on Si(100): Correlating in-plane stress and grain size distributions in W sublayer",
keywords = "Grain size distribution, Hall-Petch, Ion beam layer removal, Nanocrystalline, Residual stress profile, Tungsten thin film",
author = "Ren{\'e} Hammer and Juraj Todt and Jozef Keckes and Bernhard Sartory and Georg Parteder and Jochen Kraft and Stefan Defregger",
year = "2017",
month = oct,
day = "15",
doi = "10.1016/j.matdes.2017.06.052",
language = "English",
volume = "132.2017",
pages = "72--78",
journal = "Materials and Design",
issn = "0264-1275",
publisher = "Elsevier B.V.",
number = "15 October",
}