High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method

Titel in Übersetzung: High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method

Jozef Keckes, E. Eiper, K.J. Martinschitz, Harald Köstenbauer, Rostislav Daniel, Christian Mitterer

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

6 Zitate (Scopus)

Titel in Übersetzung	High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method
Originalsprache	Englisch
Seiten (von - bis)	036103-01-036103-03
Fachzeitschrift	Review of scientific instruments
Jahrgang	78
DOIs	https://doi.org/10.1063/1.2535857
Publikationsstatus	Veröffentlicht - 2007

Zugriff auf Dokument

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title = "High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method",

author = "Jozef Keckes and E. Eiper and K.J. Martinschitz and Harald K{\"o}stenbauer and Rostislav Daniel and Christian Mitterer",

year = "2007",

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T1 - High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method

AU - Keckes, Jozef

AU - Eiper, E.

AU - Martinschitz, K.J.

AU - Köstenbauer, Harald

AU - Daniel, Rostislav

AU - Mitterer, Christian

PY - 2007

Y1 - 2007

U2 - 10.1063/1.2535857

DO - 10.1063/1.2535857

M3 - Article

SN - 0034-6748

VL - 78

SP - 036103-01-036103-03

JO - Review of scientific instruments

JF - Review of scientific instruments

ER -