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In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM

  • R. Resch
  • , Thomas Prohaska
  • , Gernot Friedbacher
  • , Manfred Grasserbauer
  • , T Kanniainen
  • , S. Lindroos
  • , Markku Leskelä
  • , L. Niinistö
  • , J. A. C. Broekaert
  • Technische Universität Wien
  • Universität Helsinki
  • Technische Universität Dortmund

Publikation: Beitrag in FachzeitschriftArtikelForschungBegutachtung

Abstract

The growth of ZnS thin films on a mica substrate in a Successive Ionic Layer Adsorption and Reaction (SILAR) process has been studied. The films were deposited in-situ using the commercial AFM liquid cell as flow-through reactor. Reactants and rinsing water were exchanged in the cell continuously by a computer controlled valve system. In this way the film growth could be observed directly in a time resolved sequence of images taken after 1 up to 100 cycles. The results show that the stability of the films increases between 1 and 30 cycles and that a full coverage of the surface is reached after approximately 50 cycles.
OriginalspracheEnglisch
Seiten (von - bis)772-777
Seitenumfang6
FachzeitschriftFresenius' journal of analytical chemistry
Jahrgang353.1995
AusgabenummerJanuary
DOIs
PublikationsstatusVeröffentlicht - 1 Jan. 1995
Extern publiziertJa

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