Influence of TiO2(110) surface roughness on growth and stability of thin organic films

Konrad Szajna; Markus Kratzer; Dominik Wrana; Carlo Mennucci; Benedykt Jany; Francesco Buatier de Mongeot; Christian Teichert; Franciszek  Krok

Influence of TiO2(110) surface roughness on growth and stability of thin organic films

Konrad Szajna, Markus Kratzer, Dominik Wrana, Carlo Mennucci, Benedykt Jany, Francesco Buatier de Mongeot, Christian Teichert, Franciszek Krok

Lehrstuhl für Physik (460)

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

6 Zitate (Scopus)

Originalsprache	Englisch
Fachzeitschrift	Journal of chemical physics (The journal of chemical physics)
Jahrgang	145
Publikationsstatus	Veröffentlicht - 2016

Schlagwörter

Ion Bombardment
Hexaphenyl
AFM
TiO2(110)
stability

Dieses zitieren

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title = "Influence of TiO2(110) surface roughness on growth and stability of thin organic films",

keywords = "Ion Bombardment, Hexaphenyl, AFM, TiO2(110), stability",

author = "Konrad Szajna and Markus Kratzer and Dominik Wrana and Carlo Mennucci and Benedykt Jany and {Buatier de Mongeot}, Francesco and Christian Teichert and Franciszek Krok",

year = "2016",

language = "English",

volume = "145",

journal = "Journal of chemical physics (The journal of chemical physics)",

issn = "0021-9606",

publisher = "American Institute of Physics",

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TY - JOUR

T1 - Influence of TiO2(110) surface roughness on growth and stability of thin organic films

AU - Szajna, Konrad

AU - Kratzer, Markus

AU - Wrana, Dominik

AU - Mennucci, Carlo

AU - Jany, Benedykt

AU - Buatier de Mongeot, Francesco

AU - Teichert, Christian

AU - Krok, Franciszek

PY - 2016

Y1 - 2016

KW - Ion Bombardment

KW - Hexaphenyl

KW - AFM

KW - TiO2(110)

KW - stability

M3 - Article

SN - 0021-9606

VL - 145

JO - Journal of chemical physics (The journal of chemical physics)

JF - Journal of chemical physics (The journal of chemical physics)

ER -