Low Friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique

Jörg Paulitsch; M. Schenkel; A. Schintlmeister; H. Hutter; Paul Heinz Mayrhofer

doi:10.1016/j.tsf.2010.05.061

Low Friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique

Titel in Übersetzung: Low Friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique

Jörg Paulitsch, M. Schenkel, A. Schintlmeister, H. Hutter, Paul Heinz Mayrhofer

Lehrstuhl für Metallkunde (420)

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

35 Zitate (Scopus)

Titel in Übersetzung	Low Friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique
Originalsprache	Englisch
Seiten (von - bis)	5553-5557
Fachzeitschrift	Thin solid films
Jahrgang	518
DOIs	https://doi.org/10.1016/j.tsf.2010.05.061
Publikationsstatus	Veröffentlicht - 2010

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10.1016/j.tsf.2010.05.061

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title = "Low Friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique",

author = "J{\"o}rg Paulitsch and M. Schenkel and A. Schintlmeister and H. Hutter and Mayrhofer, {Paul Heinz}",

year = "2010",

doi = "10.1016/j.tsf.2010.05.061",

language = "English",

volume = "518",

pages = "5553--5557",

journal = "Thin solid films",

issn = "0040-6090",

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TY - JOUR

T1 - Low Friction CrN/TiN multilayer coatings prepared by a hybrid high power impulse magnetron sputtering/DC magnetron sputtering deposition technique

AU - Paulitsch, Jörg

AU - Schenkel, M.

AU - Schintlmeister, A.

AU - Hutter, H.

AU - Mayrhofer, Paul Heinz

PY - 2010

Y1 - 2010

U2 - 10.1016/j.tsf.2010.05.061

DO - 10.1016/j.tsf.2010.05.061

M3 - Article

SN - 0040-6090

VL - 518

SP - 5553

EP - 5557

JO - Thin solid films

JF - Thin solid films

ER -