TY - JOUR
T1 - Morphology and yield of W nanoparticles in gas aggregation
T2 - Pathways towards functional nanocomposite films
AU - Huszar, Emese
AU - Dobszay, Rita
AU - Schweizer, Peter
AU - Nelis, Thomas
AU - Casari, Daniele
AU - Gutnik, Dominik
AU - Sharma, Amit
AU - Michler, Johann
AU - Spolenak, Ralph
AU - Pethö, Laszlo
AU - Putz, Barbara
N1 - Publisher Copyright: © 2025 The Authors
PY - 2026/2/1
Y1 - 2026/2/1
N2 - While gas aggregation cluster sources can tailor the chemistry, size, and shape of nanoparticles (NPs), low NP yield and instability over time still limit the fabrication of nanoparticle-based coatings or nanocomposite films. In this work, we propose controlled addition of ambient air as a nucleation source to enhance the efficiency and stability of the process. Additionally, the type of power source is varied, juxtaposing direct current and high-power impulse magnetron sputtering. Quadruple mass spectrometry and high-resolution transmission electron microscopy are used to monitor the deposition rate and morphology of tungsten NPs (size, shape, microstructure) as a function of process parameters. We observe significant variations in the deposition rate, the average diameter (3–5 nm), and the microstructure (amorphous vs. single-crystalline) of produced W NPs. The enhanced NP flux was exploited to demonstrate fast deposition of 500 nm thick W nanoparticle films as well as 200 nm thick nanocomposite films, consisting of a Cu matrix with incorporated W nanoparticles. For the latter we attribute refinement of the Cu matrix microstructure to two competing mechanisms: Formation of growth twins facilitated by W NPs and grain refinement due to residual air.
AB - While gas aggregation cluster sources can tailor the chemistry, size, and shape of nanoparticles (NPs), low NP yield and instability over time still limit the fabrication of nanoparticle-based coatings or nanocomposite films. In this work, we propose controlled addition of ambient air as a nucleation source to enhance the efficiency and stability of the process. Additionally, the type of power source is varied, juxtaposing direct current and high-power impulse magnetron sputtering. Quadruple mass spectrometry and high-resolution transmission electron microscopy are used to monitor the deposition rate and morphology of tungsten NPs (size, shape, microstructure) as a function of process parameters. We observe significant variations in the deposition rate, the average diameter (3–5 nm), and the microstructure (amorphous vs. single-crystalline) of produced W NPs. The enhanced NP flux was exploited to demonstrate fast deposition of 500 nm thick W nanoparticle films as well as 200 nm thick nanocomposite films, consisting of a Cu matrix with incorporated W nanoparticles. For the latter we attribute refinement of the Cu matrix microstructure to two competing mechanisms: Formation of growth twins facilitated by W NPs and grain refinement due to residual air.
KW - Gas aggregation
KW - Magnetron sputtering
KW - Nanocomposites
KW - Nanoparticles
KW - Thin films
UR - https://www.scopus.com/pages/publications/105025099194
U2 - 10.1016/j.surfcoat.2025.133089
DO - 10.1016/j.surfcoat.2025.133089
M3 - Article
AN - SCOPUS:105025099194
SN - 0257-8972
VL - 2026
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
IS - Volume 521, 1 February
M1 - 133089
ER -