Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions

Titel in Übersetzung: Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

23 Zitate (Scopus)

Titel in Übersetzung	Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions
Originalsprache	Englisch
Seiten (von - bis)	3011-3016
Fachzeitschrift	Chemistry of materials
Jahrgang	19
Publikationsstatus	Veröffentlicht - 2008

Dieses zitieren

@article{50dc1d6a5e7c41fe912de9c8d4ade193,

title = "Photolithographic Patterning of Polymer Surfaces Using the Photo-Freis Rearrangement: Selective Postexposure Reactions",

author = "Thomas Grie{\ss}er and T. H{\"o}fler and S. Temmel and Wolfgang Kern and G. Trimmel",

year = "2008",

language = "English",

volume = "19",

pages = "3011--3016",

journal = "Chemistry of materials",

issn = "0897-4756",

publisher = "American Chemical Society",

}