Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Thomas Höfler; Anna M. Track; Peter Pacher; Quan Shen; Heinz-Georg Flesch; Gregor Hlawacek; Georg Koller; Michael G. Ramsey; Robert Schennach; Roland Resel; Christian Teichert; Wolfgang Kern; Thomas Grießer; Georg Trimmel

doi:10.1016/j.matchemphys.2009.08.065

Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Titel in Übersetzung: Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

Thomas Höfler, Anna M. Track, Peter Pacher, Quan Shen, Heinz-Georg Flesch, Gregor Hlawacek, Georg Koller, Michael G. Ramsey, Robert Schennach, Roland Resel, Christian Teichert, Wolfgang Kern, Thomas Grießer, Georg Trimmel

Lehrstuhl für Chemie der Kunststoffe (231)

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

10 Zitate (Scopus)

Titel in Übersetzung	Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification
Originalsprache	Englisch
Seiten (von - bis)	287-293
Fachzeitschrift	Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)
Jahrgang	119
DOIs	https://doi.org/10.1016/j.matchemphys.2009.08.065
Publikationsstatus	Veröffentlicht - 2010

Zugriff auf Dokument

10.1016/j.matchemphys.2009.08.065

Dieses zitieren

Höfler, T., Track, A. M., Pacher, P., Shen, Q., Flesch, H.-G., Hlawacek, G., Koller, G., Ramsey, M. G., Schennach, R., Resel, R., Teichert, C., Kern, W., Grießer, T., & Trimmel, G. (2010). Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials), 119, 287-293. https://doi.org/10.1016/j.matchemphys.2009.08.065

Höfler, Thomas ; Track, Anna M. ; Pacher, Peter et al. / Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. in: Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials). 2010 ; Jahrgang 119. S. 287-293.

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title = "Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification",

author = "Thomas H{\"o}fler and Track, {Anna M.} and Peter Pacher and Quan Shen and Heinz-Georg Flesch and Gregor Hlawacek and Georg Koller and Ramsey, {Michael G.} and Robert Schennach and Roland Resel and Christian Teichert and Wolfgang Kern and Thomas Grie{\ss}er and Georg Trimmel",

year = "2010",

doi = "10.1016/j.matchemphys.2009.08.065",

language = "English",

volume = "119",

pages = "287--293",

journal = "Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)",

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Höfler, T, Track, AM, Pacher, P, Shen, Q, Flesch, H-G, Hlawacek, G, Koller, G, Ramsey, MG, Schennach, R, Resel, R, Teichert, C, Kern, W, Grießer, T & Trimmel, G 2010, 'Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification', Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials), Jg. 119, S. 287-293. https://doi.org/10.1016/j.matchemphys.2009.08.065

Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. / Höfler, Thomas; Track, Anna M.; Pacher, Peter et al.
in: Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials), Jahrgang 119, 2010, S. 287-293.

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

TY - JOUR

T1 - Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification

AU - Höfler, Thomas

AU - Track, Anna M.

AU - Pacher, Peter

AU - Shen, Quan

AU - Flesch, Heinz-Georg

AU - Hlawacek, Gregor

AU - Koller, Georg

AU - Ramsey, Michael G.

AU - Schennach, Robert

AU - Resel, Roland

AU - Teichert, Christian

AU - Kern, Wolfgang

AU - Grießer, Thomas

AU - Trimmel, Georg

PY - 2010

Y1 - 2010

U2 - 10.1016/j.matchemphys.2009.08.065

DO - 10.1016/j.matchemphys.2009.08.065

M3 - Article

SN - 0254-0584

VL - 119

SP - 287

EP - 293

JO - Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)

JF - Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials)

ER -

Höfler T, Track AM, Pacher P, Shen Q, Flesch HG, Hlawacek G et al. Photoreactive molecular layers containing aryl ester units: Preparation, UV patterning and post-exposure modification. Materials chemistry and physics (including materials science communications ; an international interdisciplinary journal on science, characterization and processing of advanced materials). 2010;119:287-293. doi: 10.1016/j.matchemphys.2009.08.065