Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

Jinbo Pang; Rafael G. Mendes; Pawel S. Wrobel; Michal D. Wlodarski; Huy Quang Ta; Liang Zhao; Lars Giebeler; Barbara Trzebicka; Thomas Gemming; Lei Fu; Zhongfan Liu; Jürgen Eckert; Alicja Bachmatiuk; Mark H. Ruemmeli

doi:10.1021/acsnano.6b08069

Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

Jinbo Pang
, Rafael G. Mendes
, Pawel S. Wrobel
, Michal D. Wlodarski
, Huy Quang Ta
, Liang Zhao
, Lars Giebeler
, Barbara Trzebicka
, Thomas Gemming
, Lei Fu
, Zhongfan Liu
, Jürgen Eckert
, Alicja Bachmatiuk
, Mark H. Ruemmeli

Lehrstuhl für Materialphysik (430)

IFW Dresden
Polish Academy of Sciences, Zabrze
Soochow University
Wuhan University
Erich-Schmid-Institut für Materialwissenschaft der Österreichischen Akademie der Wissenschaften

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

83 Zitate (Scopus)

Originalsprache	Englisch
Seiten (von - bis)	1946-1956
Seitenumfang	11
Fachzeitschrift	ACS nano
Jahrgang	11.2017
Ausgabenummer	2
DOIs	https://doi.org/10.1021/acsnano.6b08069
Publikationsstatus	Veröffentlicht - Jan. 2017

Zugriff auf Dokument

10.1021/acsnano.6b08069

Dieses zitieren

Pang, J., Mendes, R. G., Wrobel, P. S., Wlodarski, M. D., Ta, H. Q., Zhao, L., Giebeler, L., Trzebicka, B., Gemming, T., Fu, L., Liu, Z., Eckert, J., Bachmatiuk, A., & Ruemmeli, M. H. (2017). Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. ACS nano, 11.2017(2), 1946-1956. https://doi.org/10.1021/acsnano.6b08069

@article{c4edfd3e1149417790d69c8fc24cb6ac,

title = "Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition",

author = "Jinbo Pang and Mendes, \{Rafael G.\} and Wrobel, \{Pawel S.\} and Wlodarski, \{Michal D.\} and Ta, \{Huy Quang\} and Liang Zhao and Lars Giebeler and Barbara Trzebicka and Thomas Gemming and Lei Fu and Zhongfan Liu and J{\"u}rgen Eckert and Alicja Bachmatiuk and Ruemmeli, \{Mark H.\}",

year = "2017",

month = jan,

doi = "10.1021/acsnano.6b08069",

language = "English",

volume = "11.2017",

pages = "1946--1956",

journal = "ACS nano",

issn = "1936-0851",

publisher = "American Chemical Society",

number = "2",

}

Pang, J, Mendes, RG, Wrobel, PS, Wlodarski, MD, Ta, HQ, Zhao, L, Giebeler, L, Trzebicka, B, Gemming, T, Fu, L, Liu, Z, Eckert, J, Bachmatiuk, A & Ruemmeli, MH 2017, 'Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition', ACS nano, Jg. 11.2017, Nr. 2, S. 1946-1956. https://doi.org/10.1021/acsnano.6b08069

TY - JOUR

T1 - Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

AU - Pang, Jinbo

AU - Mendes, Rafael G.

AU - Wrobel, Pawel S.

AU - Wlodarski, Michal D.

AU - Ta, Huy Quang

AU - Zhao, Liang

AU - Giebeler, Lars

AU - Trzebicka, Barbara

AU - Gemming, Thomas

AU - Fu, Lei

AU - Liu, Zhongfan

AU - Eckert, Jürgen

AU - Bachmatiuk, Alicja

AU - Ruemmeli, Mark H.

PY - 2017/1

Y1 - 2017/1

U2 - 10.1021/acsnano.6b08069

DO - 10.1021/acsnano.6b08069

M3 - Article

SN - 1936-0851

VL - 11.2017

SP - 1946

EP - 1956

JO - ACS nano

JF - ACS nano

IS - 2

ER -