SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE

Titel in Übersetzung: SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE

Publikation: Konferenzbeitrag › Poster › Forschung › Begutachtung

Titel in Übersetzung	SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE
Originalsprache	Englisch
Publikationsstatus	Veröffentlicht - 2010
Veranstaltung	International Workshop on In situ characterization of near-surface processes - Eisenerz, Österreich Dauer: 30 Mai 2010 → 3 Juni 2010

Konferenz	International Workshop on In situ characterization of near-surface processes
Land/Gebiet	Österreich
Ort	Eisenerz
Zeitraum	30/05/10 → 3/06/10

Dieses zitieren

@conference{71f731b3fbc5420c827888cdf99e08b6,

title = "SUB-MONOLAYER GROWTH INVESTIGATIONS OF PARA-SEXIPHENYL ON SILICON DIOXIDE",

author = "Stefan Lorbek and Gregor Hlawacek and Christian Teichert",

year = "2010",

language = "English",

note = "International Workshop on In situ characterization of near-surface processes ; Conference date: 30-05-2010 Through 03-06-2010",

}