X-ray nanodiffraction analysis of stress oscillations in a W thin film on through-silicon via

J. Todt, H. Hammer, B. Sartory, M. Burghammer, J. Kraft, R. Daniel, J. Keckes, S. Defregger

Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Begutachtung

11 Zitate (Scopus)

Originalsprache	undefiniert/unbekannt
Seiten (von - bis)	182-187
Seitenumfang	6
Fachzeitschrift	Journal of applied crystallography
Jahrgang	49
DOIs	https://doi.org/10.1107/S1600576715023419
Publikationsstatus	Veröffentlicht - 2016

cited By 1

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AU - Todt, J.

AU - Hammer, H.

AU - Sartory, B.

AU - Burghammer, M.

AU - Kraft, J.

AU - Daniel, R.

AU - Keckes, J.

AU - Defregger, S.

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