30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film

Jozef Keckes; Rostislav Daniel; Juraj Todt; Jakub Zalesak; Bernhard  Sartory; S. Braun; J. Gluch; M. Rosenthal; Manfred C. Burghammer; Christian Mitterer; S. Niese; A. Kubec

doi:10.1016/j.actamat.2017.11.049

30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiO_x thin film

Jozef Keckes, Rostislav Daniel, Juraj Todt, Jakub Zalesak, Bernhard Sartory, S. Braun, J. Gluch, M. Rosenthal, Manfred C. Burghammer, Christian Mitterer, S. Niese, A. Kubec

Research output: Contribution to journal › Article › Research › peer-review

34 Citations (Scopus)

Original language	English
Pages (from-to)	862-873
Journal	Acta materialia
Volume	144
DOIs	https://doi.org/10.1016/j.actamat.2017.11.049 https://doi.org/10.1016/j.actamat.2017.11.049
Publication status	Published - 2018

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Keckes, J., Daniel, R., Todt, J., Zalesak, J., Sartory, B., Braun, S., Gluch, J., Rosenthal, M., Burghammer, M. C., Mitterer, C., Niese, S., & Kubec, A. (2018). 30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiO_x thin film. Acta materialia, 144, 862-873. https://doi.org/10.1016/j.actamat.2017.11.049, https://doi.org/10.1016/j.actamat.2017.11.049

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title = "30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film",

author = "Jozef Keckes and Rostislav Daniel and Juraj Todt and Jakub Zalesak and Bernhard Sartory and S. Braun and J. Gluch and M. Rosenthal and Burghammer, {Manfred C.} and Christian Mitterer and S. Niese and A. Kubec",

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doi = "10.1016/j.actamat.2017.11.049",

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Keckes, J , Daniel, R , Todt, J, Zalesak, J, Sartory, B, Braun, S, Gluch, J, Rosenthal, M, Burghammer, MC, Mitterer, C, Niese, S & Kubec, A 2018, '30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiO_x thin film', Acta materialia, vol. 144, pp. 862-873. https://doi.org/10.1016/j.actamat.2017.11.049, https://doi.org/10.1016/j.actamat.2017.11.049

TY - JOUR

T1 - 30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film

AU - Keckes, Jozef

AU - Daniel, Rostislav

AU - Todt, Juraj

AU - Zalesak, Jakub

AU - Sartory, Bernhard

AU - Braun, S.

AU - Gluch, J.

AU - Rosenthal, M.

AU - Burghammer, Manfred C.

AU - Mitterer, Christian

AU - Niese, S.

AU - Kubec, A.

PY - 2018

Y1 - 2018

UR - http://www.scopus.com/inward/record.url?eid=2-s2.0-85036475895&partnerID=MN8TOARS

U2 - 10.1016/j.actamat.2017.11.049

DO - 10.1016/j.actamat.2017.11.049

M3 - Article

SN - 1359-6454

VL - 144

SP - 862

EP - 873

JO - Acta materialia

JF - Acta materialia

ER -

30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiOx thin film

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30 nm X-ray focusing correlates oscillatory stress, texture and structural defect gradients across multilayered Ti N-SiO_x thin film