Abstract
Efficient water splitting is a major challenge in green hydrogen production and energy transition. Thus, considerable scientific efforts are devoted to optimize surface geometries for enhancing the performance of water-splitting catalysts. The current study aims to develop a reliable and facile 3-step (re-)production technique for manufacturing structured surfaces by combining multi-photon lithography (MPL) and nanoimprint lithography (NIL). MPL enables structuring of high-definition micrometer-scale surface geometries. A variation of these topologies was used as masks for replication by NIL. Thus, molds were derived to emboss the original nanostructured topologies repeatedly into a UV-curable resin. Subsequently, a Ni thin film metallization was deposited by physical vapor deposition onto the final imprinted polymeric structures, thereby realizing topologically structured conductive electrodes. To demonstrate the applicability of this elaborated technique, the catalytic activities towards the hydrogen evolution reaction were assessed for different surface geometries. An increase in catalytic performance was achieved through surface enlargement by structuring, whereby a direct contribution of the specific structure geometry was not evident. This elegant method is highly versatile and scalable for producing a wide range of structured functional surfaces on a lab scale, as demonstrated for the water splitting reaction, with results transferable to an industrial scale.
| Original language | English |
|---|---|
| Article number | 113809 |
| Journal | Materials and Design |
| Volume | 252.2025 |
| Issue number | April |
| DOIs | |
| Publication status | Published - 5 Mar 2025 |
Bibliographical note
Publisher Copyright: © 2025 The AuthorsUN SDGs
This output contributes to the following UN Sustainable Development Goals (SDGs)
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SDG 7 Affordable and Clean Energy
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SDG 9 Industry, Innovation, and Infrastructure
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SDG 12 Responsible Consumption and Production
Keywords
- Catalysis
- Hydrogen evolution reaction
- Multi-photon lithography
- Nanoimprint lithography
- Physical vapor deposition
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