Ab initio study of oxygen vacancy filament formation at Ta/HfO2 interface

Donglan Zhang, Jiong Wang, Qing Wu, Yong Du, David Holec

Research output: Contribution to journalArticleResearchpeer-review

Original languageEnglish
Pages (from-to)1-11
JournalSurfaces and Interfaces
Volume2024
Issue number49
DOIs
Publication statusPublished - 2024

Cite this