Original language | English |
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Pages (from-to) | 698-701 |
Journal | Fresenius' journal of analytical chemistry |
Publication status | Published - 1995 |
AFM investigation of silicon substrates for chemical vapour deposition of diamond films
Thomas Prohaska, G. M. Fuchs, G FRIEDBACHER, D. Schwarzbach, E. Bouveresse, M GRASSERBAUER
Research output: Contribution to journal › Article › Research › peer-review
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Citation
(Scopus)