Analysis of the thermal and temporal stability of Ta and Ti thin films onto SAW–substrate materials (LiNbO3 and LiTaO3) using AR-XPS

U. Vogel, Thomas Gemming, Jürgen Eckert, Stefan Oswald

Research output: Contribution to journalArticleResearchpeer-review

2 Citations (Scopus)
Original languageEnglish
Pages (from-to)570-574
Number of pages5
JournalSurface and interface analysis
Volume48.2016
Issue number7
DOIs
Publication statusE-pub ahead of print - 30 Mar 2016

Keywords

  • ARXPS
  • LiNbO
  • LiTaO
  • SAW
  • stability
  • tantalum deposition
  • titanium deposition

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