TY - JOUR
T1 - Angular-dependent deposition of MoNbTaVW HEA thin films by three different physical vapor deposition methods
AU - Xia, Ao
AU - Togni, Allessandro
AU - Hirn, Sabrina
AU - Bolelli, Giovanni
AU - Lusvarghi, Luca
AU - Franz, Robert
PY - 2020/1/17
Y1 - 2020/1/17
N2 - Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.
AB - Within this work, MoNbTaVW high entropy alloy thin films were synthesized by dc magnetron sputter deposition, high power impulse magnetron sputtering and cathodic arc deposition to study the influence of the growth conditions on structure and properties of the films. For deposition angles ranging from 0 to 90°, the deposition rate, chemical composition, morphology and crystal structure as well as the mechanical properties were analyzed. All films showed the formation of a solid solution with body centered cubic structure regardless of deposition angle and method, whereas higher energetic growth conditions were beneficial for improved mechanical properties.
UR - http://www.scopus.com/inward/record.url?scp=85078571634&partnerID=8YFLogxK
U2 - 10.1016/j.surfcoat.2020.125356
DO - 10.1016/j.surfcoat.2020.125356
M3 - Article
SN - 0257-8972
VL - 385.2020
JO - Surface & coatings technology
JF - Surface & coatings technology
IS - March
M1 - 125356
ER -