Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

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Translated title of the contribution	Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method
Original language	English
Pages (from-to)	321-330
Journal	Thin solid films
DOIs	https://doi.org/10.1016/j.tsf.2014.06.003
Publication status	Published - 2014

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@article{d7b3277c227444e4aa2561c61891eb3c,

title = "Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method",

author = "Ronald Sch{\"o}ngrundner and Ruth Treml and Thomas Antretter and Darian Kozic and Werner Ecker and Daniel Kiener",

year = "2014",

doi = "10.1016/j.tsf.2014.06.003",

language = "English",

pages = "321--330",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

}

TY - JOUR

T1 - Critical assessment of the determination of residual stress profiles in thin films by means of the ion beam layer removal method

AU - Schöngrundner, Ronald

AU - Treml, Ruth

AU - Antretter, Thomas

AU - Kozic, Darian

AU - Ecker, Werner

AU - Kiener, Daniel

PY - 2014

Y1 - 2014

U2 - 10.1016/j.tsf.2014.06.003

DO - 10.1016/j.tsf.2014.06.003

M3 - Article

SN - 0040-6090

SP - 321

EP - 330

JO - Thin solid films

JF - Thin solid films

ER -