Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene

Gregor Hlawacek, Fawad S. Khokar, Raoul van Gastel, Christian Teichert, Bene Poelsema

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Translated title of the contribution	Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene
Original language	English
Pages (from-to)	15:1-15:7
Journal	IBM journal of research and development [Elektronische Ressource]
Volume	55
DOIs	https://doi.org/10.1147/JRD.2011.2160303
Publication status	Published - 2011

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title = "Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene",

author = "Gregor Hlawacek and Khokar, {Fawad S.} and {van Gastel}, Raoul and Christian Teichert and Bene Poelsema",

year = "2011",

doi = "10.1147/JRD.2011.2160303",

language = "English",

volume = "55",

pages = "15:1--15:7",

journal = "IBM journal of research and development [Elektronische Ressource]",

issn = "0018-8646",

publisher = "IBM Corporation",

}

TY - JOUR

T1 - Diffusion and submonolayer growth of para-sexiphenyl on Ir(111) and Ir(111)-supported graphene

AU - Hlawacek, Gregor

AU - Khokar, Fawad S.

AU - van Gastel, Raoul

AU - Teichert, Christian

AU - Poelsema, Bene

PY - 2011

Y1 - 2011

U2 - 10.1147/JRD.2011.2160303

DO - 10.1147/JRD.2011.2160303

M3 - Article

SN - 0018-8646

VL - 55

SP - 15:1-15:7

JO - IBM journal of research and development [Elektronische Ressource]

JF - IBM journal of research and development [Elektronische Ressource]

ER -