Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

David Holec; Richard Rachbauer; M. Lattemann; L. Hultman; Jörg Paulitsch; Paul Heinz Mayrhofer

Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

David Holec
, Richard Rachbauer
, M. Lattemann
, L. Hultman
, Jörg Paulitsch
, Paul Heinz Mayrhofer

Chair of Functional Materials and Materials Systems (425)

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films
Original language	English
Publication status	Published - 2012
Event	4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials - Aichi, Japan Duration: 4 Mar 2012 → 8 Mar 2012

Conference

Conference	4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials
Country/Territory	Japan
City	Aichi
Period	4/03/12 → 8/03/12

Cite this

@conference{c6b465ba5e5d4f2dac4a2e5873d0d846,

title = "Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films",

author = "David Holec and Richard Rachbauer and M. Lattemann and L. Hultman and J{\"o}rg Paulitsch and Mayrhofer, \{Paul Heinz\}",

year = "2012",

language = "English",

note = "4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials ; Conference date: 04-03-2012 Through 08-03-2012",

}

Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films. / Holec, David; Rachbauer, Richard; Lattemann, M. et al.
2012. Poster session presented at 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, Aichi, Japan.

Research output: Contribution to conference › Poster › Research › peer-review

TY - CONF

T1 - Electronic origin of structure and mechanical properties in Y and Nb alloyed Ti-Al-N thin films

AU - Holec, David

AU - Rachbauer, Richard

AU - Lattemann, M.

AU - Hultman, L.

AU - Paulitsch, Jörg

AU - Mayrhofer, Paul Heinz

PY - 2012

Y1 - 2012

M3 - Poster

T2 - 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials

Y2 - 4 March 2012 through 8 March 2012

ER -