Fabrication of Amorphous Silicon-Carbon Hybrid Films using Single Source Precursors

Aileen Sauermoser, Thomas Lainer, Christine Bandl, Michael Haas, Andreas Knoechl, Freskida Goni, Roland Fischer, Harald Fitzek, Martina Dienstleder, Christine Prietl, Anne Marie Kelterer, Christine Bandl, Georg Jakopic, Gerald Kothleitner, Michael Haas

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The aim of this study was the preparation of different amorphous silicon–carbon hybrid thin-layer materials according to the liquid phase deposition (LPD) process using single-source precursors. In our study, 2-methyl-2-silyltrisilane (methylisotetrasilane; 2), 1,1,1-trimethyl-2,2-disilyltrisilane (trimethylsilylisotetrasilane; 3), 2-phenyl-2-silyltrisilane (phenylisotetrasilane; 4), and 1,1,2,2,4,4,5,5-octamethyl-3,3,6,6-tetrasilylcyclohexasilane (cyclohexasilane; 5) were utilized as precursor materials and compared with the parent compound 2,2-disilyltrisilane (neopentasilane; 1). Compounds 2–5 were successfully oligomerized at λ = 365 nm with catalytic amounts of the neopentasilane oligomer (NPO). These oligomeric mixtures (NPO and 6–9) were used for the preparation of thin-layer materials. Optimum solution and spin coating conditions were investigated, and amorphous silicon–carbon films were obtained. All thin-layer materials were characterized via UV/vis spectroscopy, light microscopy, spectroscopic ellipsometry, XPS, SEM, and SEM/EDX. Our results show that the carbon content and especially the bandgap can be easily tuned using these single-source precursors via LPD.
Translated title of the contributionHErstellung amorpher Silicium-Kohlenstoff-Hybridschichten mit Precursoren aus einer Quelle
Original languageEnglish
Pages (from-to)15490-15501
Number of pages12
JournalInorganic chemistry
Issue number38
Publication statusPublished - 12 Sept 2023

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