Hierarchy of adhesion forces in patterns of photoreactive surface layers

Gregor Hlawacek, Quan Shen, Christian Teichert, Alexandra Lex, Gregor Trimmel, Wolfgang Kern

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Translated title of the contribution	Hierarchy of adhesion forces in patterns of photoreactive surface layers
Original language	English
Pages (from-to)	44703-1-44703-5
Journal	Journal of chemical physics (The journal of chemical physics)
Volume	130
DOIs	https://doi.org/https://doi.org/10.1063/1.3062841
Publication status	Published - 2009

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title = "Hierarchy of adhesion forces in patterns of photoreactive surface layers",

author = "Gregor Hlawacek and Quan Shen and Christian Teichert and Alexandra Lex and Gregor Trimmel and Wolfgang Kern",

year = "2009",

doi = "http://dx.doi.org/http://dx.doi.org/10.1063/1.3062841",

language = "English",

volume = "130",

pages = "44703--1--44703--5",

journal = "Journal of chemical physics (The journal of chemical physics)",

issn = "0021-9606",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Hierarchy of adhesion forces in patterns of photoreactive surface layers

AU - Hlawacek, Gregor

AU - Shen, Quan

AU - Teichert, Christian

AU - Lex, Alexandra

AU - Trimmel, Gregor

AU - Kern, Wolfgang

PY - 2009

Y1 - 2009

U2 - http://dx.doi.org/http://dx.doi.org/10.1063/1.3062841

DO - http://dx.doi.org/http://dx.doi.org/10.1063/1.3062841

M3 - Article

SN - 0021-9606

VL - 130

SP - 44703-1-44703-5

JO - Journal of chemical physics (The journal of chemical physics)

JF - Journal of chemical physics (The journal of chemical physics)

ER -