High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method

Jozef Keckes, E. Eiper, K.J. Martinschitz, Harald Köstenbauer, Rostislav Daniel, Christian Mitterer

Research output: Contribution to journal › Article › Research › peer-review

6 Citations (Scopus)

Translated title of the contribution	High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method
Original language	English
Pages (from-to)	036103-01-036103-03
Journal	Review of scientific instruments
Volume	78
DOIs	https://doi.org/10.1063/1.2535857
Publication status	Published - 2007

Access to Document

@article{69c760115f624ab5b0920d437fae853a,

title = "High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method",

author = "Jozef Keckes and E. Eiper and K.J. Martinschitz and Harald K{\"o}stenbauer and Rostislav Daniel and Christian Mitterer",

year = "2007",

doi = "10.1063/1.2535857",

language = "English",

volume = "78",

pages = "036103--01--036103--03",

journal = "Review of scientific instruments",

issn = "0034-6748",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - High-temperature residual stresses in thin films characterized by x-ray diffraction substrate curvature method

AU - Keckes, Jozef

AU - Eiper, E.

AU - Martinschitz, K.J.

AU - Köstenbauer, Harald

AU - Daniel, Rostislav

AU - Mitterer, Christian

PY - 2007

Y1 - 2007

U2 - 10.1063/1.2535857

DO - 10.1063/1.2535857

M3 - Article

SN - 0034-6748

VL - 78

SP - 036103-01-036103-03

JO - Review of scientific instruments

JF - Review of scientific instruments

ER -