High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation

Martin Rester; Jörg Neidhardt; Christian Mitterer; P. Eklund; J. Emmerlich; H. Ljungcrantz; H. Högberg; L. Hultman

High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation

Martin Rester, Jörg Neidhardt, Christian Mitterer, P. Eklund, J. Emmerlich, H. Ljungcrantz, H. Högberg, L. Hultman

Chair of Physical Metallurgy (420)

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation
Original language	English
Publication status	Published - 2005
Event	13. International Conference on Thin Films (ICTF) - Stockholm, Sweden Duration: 20 Jun 2005 → 23 Jun 2005

Conference

Conference	13. International Conference on Thin Films (ICTF)
Country/Territory	Sweden
City	Stockholm
Period	20/06/05 → 23/06/05

Cite this

@conference{3b339d19dd4148d39e6f6027765bfba2,

title = "High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation",

author = "Martin Rester and J{\"o}rg Neidhardt and Christian Mitterer and P. Eklund and J. Emmerlich and H. Ljungcrantz and H. H{\"o}gberg and L. Hultman",

year = "2005",

language = "English",

note = "13. International Conference on Thin Films (ICTF) ; Conference date: 20-06-2005 Through 23-06-2005",

}

TY - CONF

T1 - High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation

AU - Rester, Martin

AU - Neidhardt, Jörg

AU - Mitterer, Christian

AU - Eklund, P.

AU - Emmerlich, J.

AU - Ljungcrantz, H.

AU - Högberg, H.

AU - Hultman, L.

PY - 2005

Y1 - 2005

M3 - Poster

T2 - 13. International Conference on Thin Films (ICTF)

Y2 - 20 June 2005 through 23 June 2005

ER -