High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation

Martin Rester; Jörg Neidhardt; Christian Mitterer; P. Eklund; J. Emmerlich; H. Ljungcrantz; H. Högberg; L. Hultman

High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation

Martin Rester
, Jörg Neidhardt
, Christian Mitterer
, P. Eklund
, J. Emmerlich
, H. Ljungcrantz
, H. Högberg
, L. Hultman

Chair of Physical Metallurgy (420)

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation
Original language	English
Publication status	Published - 2005
Event	13. International Conference on Thin Films (ICTF) - Stockholm, Sweden Duration: 20 Jun 2005 → 23 Jun 2005

Conference

Conference	13. International Conference on Thin Films (ICTF)
Country/Territory	Sweden
City	Stockholm
Period	20/06/05 → 23/06/05

Cite this

@conference{3b339d19dd4148d39e6f6027765bfba2,

title = "High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation",

author = "Martin Rester and J{\"o}rg Neidhardt and Christian Mitterer and P. Eklund and J. Emmerlich and H. Ljungcrantz and H. H{\"o}gberg and L. Hultman",

year = "2005",

language = "English",

note = "13. International Conference on Thin Films (ICTF) ; Conference date: 20-06-2005 Through 23-06-2005",

}

TY - CONF

T1 - High temperature Studies of Ti-Si-C Thin Films with Respect to Potential MAX Phase Formation

AU - Rester, Martin

AU - Neidhardt, Jörg

AU - Mitterer, Christian

AU - Eklund, P.

AU - Emmerlich, J.

AU - Ljungcrantz, H.

AU - Högberg, H.

AU - Hultman, L.

PY - 2005

Y1 - 2005

M3 - Poster

T2 - 13. International Conference on Thin Films (ICTF)

Y2 - 20 June 2005 through 23 June 2005

ER -