Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism

Gregor Hlawacek; Vasilisa Veligura; Stefan Lorbek; Tijs F. Mocking; Antony George; Raoul van Gastel; Harold J. W. Zandvliet; Bene Poelsema

doi:10.3762%2Fbjnano.3.58

Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism

Gregor Hlawacek, Vasilisa Veligura, Stefan Lorbek, Tijs F. Mocking, Antony George, Raoul van Gastel, Harold J. W. Zandvliet, Bene Poelsema

Chair of Physics (460)

Research output: Contribution to journal › Article › Research › peer-review

31 Citations (Scopus)

Translated title of the contribution	Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism
Original language	English
Pages (from-to)	507-512
Journal	Beilstein journal of nanotechnology
Volume	3
DOIs	https://doi.org/10.3762%2Fbjnano.3.58
Publication status	Published - 2012

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10.3762%2Fbjnano.3.58

Cite this

@article{7164e1adfa204f67b0e84122ad9a4a6e,

title = "Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism",

author = "Gregor Hlawacek and Vasilisa Veligura and Stefan Lorbek and Mocking, {Tijs F.} and Antony George and {van Gastel}, Raoul and Zandvliet, {Harold J. W.} and Bene Poelsema",

year = "2012",

doi = "10.3762%2Fbjnano.3.58",

language = "English",

volume = "3",

pages = "507--512",

journal = "Beilstein journal of nanotechnology ",

issn = "2190-4286",

publisher = "Beilstein-Institut Zur Forderung der Chemischen Wissenschaften",

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TY - JOUR

T1 - Imaging ultra thin layers with helium ion microscopy: Utilizing the channeling contrast mechanism

AU - Hlawacek, Gregor

AU - Veligura, Vasilisa

AU - Lorbek, Stefan

AU - Mocking, Tijs F.

AU - George, Antony

AU - van Gastel, Raoul

AU - Zandvliet, Harold J. W.

AU - Poelsema, Bene

PY - 2012

Y1 - 2012

U2 - 10.3762%2Fbjnano.3.58

DO - 10.3762%2Fbjnano.3.58

M3 - Article

SN - 2190-4286

VL - 3

SP - 507

EP - 512

JO - Beilstein journal of nanotechnology

JF - Beilstein journal of nanotechnology

ER -