In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM

R. Resch; Thomas Prohaska; Gernot Friedbacher; Manfred Grasserbauer; T Kanniainen; S. Lindroos; Markku Leskelä; L. Niinistö; J. A. C. Broekaert

doi:10.1007/BF00321369

In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM

R. Resch
, Thomas Prohaska
, Gernot Friedbacher
, Manfred Grasserbauer
, T Kanniainen
, S. Lindroos
, Markku Leskelä
, L. Niinistö
, J. A. C. Broekaert

Institute of Materials Science and Technology
University of Helsinki
Tu Dortmund University

Research output: Contribution to journal › Article › Research › peer-review

Abstract

The growth of ZnS thin films on a mica substrate in a Successive Ionic Layer Adsorption and Reaction (SILAR) process has been studied. The films were deposited in-situ using the commercial AFM liquid cell as flow-through reactor. Reactants and rinsing water were exchanged in the cell continuously by a computer controlled valve system. In this way the film growth could be observed directly in a time resolved sequence of images taken after 1 up to 100 cycles. The results show that the stability of the films increases between 1 and 30 cycles and that a full coverage of the surface is reached after approximately 50 cycles.

Original language	English
Pages (from-to)	772-777
Number of pages	6
Journal	Fresenius' journal of analytical chemistry
Volume	353.1995
Issue number	January
DOIs	https://doi.org/10.1007/BF00321369
Publication status	Published - 1 Jan 1995
Externally published	Yes

Access to Document

10.1007/BF00321369

Cite this

Resch, R., Prohaska, T., Friedbacher, G., Grasserbauer, M., Kanniainen, T., Lindroos, S., Leskelä, M., Niinistö, L., & Broekaert, J. A. C. (1995). In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM. Fresenius' journal of analytical chemistry , 353.1995(January), 772-777. https://doi.org/10.1007/BF00321369

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title = "In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM",

abstract = "The growth of ZnS thin films on a mica substrate in a Successive Ionic Layer Adsorption and Reaction (SILAR) process has been studied. The films were deposited in-situ using the commercial AFM liquid cell as flow-through reactor. Reactants and rinsing water were exchanged in the cell continuously by a computer controlled valve system. In this way the film growth could be observed directly in a time resolved sequence of images taken after 1 up to 100 cycles. The results show that the stability of the films increases between 1 and 30 cycles and that a full coverage of the surface is reached after approximately 50 cycles.",

author = "R. Resch and Thomas Prohaska and Gernot Friedbacher and Manfred Grasserbauer and T Kanniainen and S. Lindroos and Markku Leskel{\"a} and L. Niinist{\"o} and Broekaert, \{J. A. C.\}",

year = "1995",

month = jan,

day = "1",

doi = "10.1007/BF00321369",

language = "English",

volume = "353.1995",

pages = "772--777",

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}

Resch, R, Prohaska, T, Friedbacher, G, Grasserbauer, M, Kanniainen, T, Lindroos, S, Leskelä, M, Niinistö, L & Broekaert, JAC 1995, 'In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM', Fresenius' journal of analytical chemistry , vol. 353.1995, no. January, pp. 772-777. https://doi.org/10.1007/BF00321369

In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM. / Resch, R.; Prohaska, Thomas; Friedbacher, Gernot et al.
In: Fresenius' journal of analytical chemistry , Vol. 353.1995, No. January, 01.01.1995, p. 772-777.

Research output: Contribution to journal › Article › Research › peer-review

TY - JOUR

T1 - In-Situ investigation of deposition of ZnS thin films on mica by successive ionic layer adsorption and reaction method as studied by AFM

AU - Resch, R.

AU - Prohaska, Thomas

AU - Friedbacher, Gernot

AU - Grasserbauer, Manfred

AU - Kanniainen, T

AU - Lindroos, S.

AU - Leskelä, Markku

AU - Niinistö, L.

AU - Broekaert, J. A. C.

PY - 1995/1/1

Y1 - 1995/1/1

N2 - The growth of ZnS thin films on a mica substrate in a Successive Ionic Layer Adsorption and Reaction (SILAR) process has been studied. The films were deposited in-situ using the commercial AFM liquid cell as flow-through reactor. Reactants and rinsing water were exchanged in the cell continuously by a computer controlled valve system. In this way the film growth could be observed directly in a time resolved sequence of images taken after 1 up to 100 cycles. The results show that the stability of the films increases between 1 and 30 cycles and that a full coverage of the surface is reached after approximately 50 cycles.

AB - The growth of ZnS thin films on a mica substrate in a Successive Ionic Layer Adsorption and Reaction (SILAR) process has been studied. The films were deposited in-situ using the commercial AFM liquid cell as flow-through reactor. Reactants and rinsing water were exchanged in the cell continuously by a computer controlled valve system. In this way the film growth could be observed directly in a time resolved sequence of images taken after 1 up to 100 cycles. The results show that the stability of the films increases between 1 and 30 cycles and that a full coverage of the surface is reached after approximately 50 cycles.

U2 - 10.1007/BF00321369

DO - 10.1007/BF00321369

M3 - Article

SN - 0937-0633

VL - 353.1995

SP - 772

EP - 777

JO - Fresenius' journal of analytical chemistry

JF - Fresenius' journal of analytical chemistry

IS - January

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