Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth

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24 Citations (Scopus)

Original language	English
Pages (from-to)	1-11
Number of pages	11
Journal	Plasma sources science & technology
Volume	25
DOIs	https://doi.org/10.1088/0963-0252/25/1/015022
Publication status	Published - 2016

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@article{6da37ff5e8e249f087f3ff3d9bf8002c,

title = "Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth",

author = "Robert Franz and C{\'e}sar Clavero and Andr{\'e} Anders and Jonathan Kolbeck",

year = "2016",

doi = "10.1088/0963-0252/25/1/015022",

language = "English",

volume = "25",

pages = "1--11",

journal = "Plasma sources science \& technology",

issn = "0963-0252",

publisher = "IOP Publishing Ltd.",

}

TY - JOUR

T1 - Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbOx film growth

AU - Franz, Robert

AU - Clavero, César

AU - Anders, André

AU - Kolbeck, Jonathan

PY - 2016

Y1 - 2016

U2 - 10.1088/0963-0252/25/1/015022

DO - 10.1088/0963-0252/25/1/015022

M3 - Article

SN - 0963-0252

VL - 25

SP - 1

EP - 11

JO - Plasma sources science & technology

JF - Plasma sources science & technology

ER -