Abstract
Functional transition metal oxynitrides (Me-O-N) are emerging materials that are known for their tunable and often enhanced physical properties compared to conventional oxides. As, however, relatively little is known about the Mo-O-N system, this study illuminates the influence of N on the microstructure as well as the mechanical, optical and electrical properties. Mo-O-N films were grown by DC reactive magnetron sputter deposition at different reactive gas flow N2/(O2+N2) ratios. The films change with increasing fraction of N, from an amorphous, transparent and non-conductive with inferior mechanical properties to crystalline, metal-like conductive and hard. Additionally, the film thickness affects the optical and electrical properties.
Translated title of the contribution | Einfluss des Reaktivgasflussverhältnisses während der Sputterbeschichtung dünner Mo-O-N Schichten auf deren Struktur und Eigenschaften |
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Original language | English |
Qualification | Dipl.-Ing. |
Awarding Institution |
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Supervisors/Advisors |
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Award date | 19 Oct 2018 |
Publication status | Published - 2018 |
Bibliographical note
no embargoKeywords
- Mo-O-N system
- thin films
- DC reactive magnetron sputtering
- microstructure
- mechanical properties
- optical properties
- electrical properties