Influence of reactive gas flow ratio during sputter deposition of Mo-O-N thin films on their structure and properties

Thaddäa Rath

Research output: ThesisMaster's Thesis

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Abstract

Functional transition metal oxynitrides (Me-O-N) are emerging materials that are known for their tunable and often enhanced physical properties compared to conventional oxides. As, however, relatively little is known about the Mo-O-N system, this study illuminates the influence of N on the microstructure as well as the mechanical, optical and electrical properties. Mo-O-N films were grown by DC reactive magnetron sputter deposition at different reactive gas flow N2/(O2+N2) ratios. The films change with increasing fraction of N, from an amorphous, transparent and non-conductive with inferior mechanical properties to crystalline, metal-like conductive and hard. Additionally, the film thickness affects the optical and electrical properties.
Translated title of the contributionEinfluss des Reaktivgasflussverhältnisses während der Sputterbeschichtung dünner Mo-O-N Schichten auf deren Struktur und Eigenschaften
Original languageEnglish
QualificationDipl.-Ing.
Awarding Institution
  • Montanuniversität
Supervisors/Advisors
  • Mitterer, Christian, Supervisor (internal)
  • Franz, Robert, Co-Supervisor (internal)
Award date19 Oct 2018
Publication statusPublished - 2018

Bibliographical note

no embargo

Keywords

  • Mo-O-N system
  • thin films
  • DC reactive magnetron sputtering
  • microstructure
  • mechanical properties
  • optical properties
  • electrical properties

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