Influence of the deposition parameters on the nanolamella periodicity of chemical vapor deposited Ti1-xAlxN

Christian Saringer, Michael Tkadletz, Josef Thurner, Christoph Czettl, Nina Schalk

Research output: Contribution to journalArticleResearchpeer-review


Owing to its extraordinary nanolamellar microstructure, chemical vapor deposited Ti 1-xAl xN has gained considerable interest in the recent years. However, the formation mechanism of the nanolamellae is not yet understood and is currently subject of intense research. In this publication we have deposited Ti 1-xAl xN coatings at varying temperature, pressure and rotation speed of the central gas feed. Transmission electron microscopy has been conducted in order to quantify the lamella periodicity and correlate it with the deposition parameters. This work demonstrates that nanolamellae can be obtained over a wide range of deposition parameters and, more importantly, that the periodicity does not seem to depend on the gas feed rotation but can be correlated with deposition temperature and pressure.

Original languageEnglish
Article number130819
Number of pages4
JournalMaterials letters
Issue number15 December
Early online date5 Sept 2021
Publication statusPublished - 15 Dec 2021

Bibliographical note

Publisher Copyright: © 2021

Cite this