Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5

Robert Hollerweger, David Holec, J. Paultisch, Richard Rachbauer, P. Polcik, P.H. Mayrhofer

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11 Citations (Scopus)

Translated title of the contribution	Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5
Original language	English
Pages (from-to)	335203-335210
Journal	Journal of physics / D, Applied physics
Volume	46
DOIs	https://doi.org/10.1088/0022-3727/46/33/335203
Publication status	Published - 2013

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@article{8a435da99f9d4fc482ab66be9efb26e5,

title = "Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5",

author = "Robert Hollerweger and David Holec and J. Paultisch and Richard Rachbauer and P. Polcik and P.H. Mayrhofer",

year = "2013",

doi = "10.1088/0022-3727/46/33/335203",

language = "English",

volume = "46",

pages = "335203--335210",

journal = "Journal of physics / D, Applied physics",

issn = "0022-3727",

publisher = "Institute of Physics",

}

TY - JOUR

T1 - Magnetic field strength influence on the reactive magnetron sputter deposition of Ta2O5

AU - Hollerweger, Robert

AU - Holec, David

AU - Paultisch, J.

AU - Rachbauer, Richard

AU - Polcik, P.

AU - Mayrhofer, P.H.

PY - 2013

Y1 - 2013

U2 - 10.1088/0022-3727/46/33/335203

DO - 10.1088/0022-3727/46/33/335203

M3 - Article

SN - 0022-3727

VL - 46

SP - 335203

EP - 335210

JO - Journal of physics / D, Applied physics

JF - Journal of physics / D, Applied physics

ER -