Microstructure and stress gradients in TiW thin films characterized by 40 nm X-ray diffraction and transmission electron microscopy

Fahimeh Saghaeian, Jozef Keckes, Stefan Woehlert, M. Rosenthal, M. Reisinger, J. Todt

Research output: Contribution to journalArticleResearchpeer-review

3 Citations (Scopus)
Original languageEnglish
Article number137576
Number of pages7
JournalThin solid films
Issue number1 December
Publication statusE-pub ahead of print - 14 Oct 2019


  • Internal stress
  • Residual stress
  • Thin film
  • Titanium tungsten, Diffusion barrier
  • X-ray nanodiffraction

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