Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis

Alexander M. Korsunsky; E. Salvati; A.G.J. Lunt; T. Sui; Z.M. Mughal; Rostislav Daniel; Jozef Keckes; E. Bemporad; M. Sebastiani

doi:10.1016/j.matdes.2018.02.044

Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis

Alexander M. Korsunsky, E. Salvati, A.G.J. Lunt, T. Sui, Z.M. Mughal, Rostislav Daniel, Jozef Keckes, E. Bemporad, M. Sebastiani

Research output: Contribution to journal › Article › Research › peer-review

39 Citations (Scopus)

Original language	English
Pages (from-to)	55-64
Journal	Materials and Design
Volume	145
DOIs	https://doi.org/10.1016/j.matdes.2018.02.044
Publication status	Published - 2018

Access to Document

10.1016/j.matdes.2018.02.044

Cite this

@article{bfeb93d7ebb3444db0425452a5fc2b97,

title = "Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis",

author = "Korsunsky, {Alexander M.} and E. Salvati and A.G.J. Lunt and T. Sui and Z.M. Mughal and Rostislav Daniel and Jozef Keckes and E. Bemporad and M. Sebastiani",

year = "2018",

doi = "10.1016/j.matdes.2018.02.044",

language = "English",

volume = "145",

pages = "55--64",

journal = "Materials and Design",

issn = "0264-1275",

publisher = "Elsevier",

}

TY - JOUR

T1 - Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis

AU - Korsunsky, Alexander M.

AU - Salvati, E.

AU - Lunt, A.G.J.

AU - Sui, T.

AU - Mughal, Z.M.

AU - Daniel, Rostislav

AU - Keckes, Jozef

AU - Bemporad, E.

AU - Sebastiani, M.

PY - 2018

Y1 - 2018

U2 - 10.1016/j.matdes.2018.02.044

DO - 10.1016/j.matdes.2018.02.044

M3 - Article

SN - 0264-1275

VL - 145

SP - 55

EP - 64

JO - Materials and Design

JF - Materials and Design

ER -