Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis

Alexander M. Korsunsky; E. Salvati; A.G.J. Lunt; T. Sui; Z.M. Mughal; Rostislav Daniel; Jozef Keckes; E. Bemporad; M. Sebastiani

doi:10.1016/j.matdes.2018.02.044

Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis

Alexander M. Korsunsky
, E. Salvati
, A.G.J. Lunt
, T. Sui
, Z.M. Mughal
, Rostislav Daniel
, Jozef Keckes
, E. Bemporad
, M. Sebastiani

Research output: Contribution to journal › Article › Research › peer-review

39 Citations (Scopus)

Original language	English
Pages (from-to)	55-64
Journal	Materials and Design
Volume	145
DOIs	https://doi.org/10.1016/j.matdes.2018.02.044
Publication status	Published - 2018

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10.1016/j.matdes.2018.02.044

Cite this

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title = "Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis",

author = "Korsunsky, \{Alexander M.\} and E. Salvati and A.G.J. Lunt and T. Sui and Z.M. Mughal and Rostislav Daniel and Jozef Keckes and E. Bemporad and M. Sebastiani",

year = "2018",

doi = "10.1016/j.matdes.2018.02.044",

language = "English",

volume = "145",

pages = "55--64",

journal = "Materials and Design",

issn = "0264-1275",

publisher = "Elsevier B.V.",

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T1 - Nanoscale residual stress depth profiling by focused ion beam milling and eigenstrain analysis

AU - Korsunsky, Alexander M.

AU - Salvati, E.

AU - Lunt, A.G.J.

AU - Sui, T.

AU - Mughal, Z.M.

AU - Daniel, Rostislav

AU - Keckes, Jozef

AU - Bemporad, E.

AU - Sebastiani, M.

PY - 2018

Y1 - 2018

U2 - 10.1016/j.matdes.2018.02.044

DO - 10.1016/j.matdes.2018.02.044

M3 - Article

SN - 0264-1275

VL - 145

SP - 55

EP - 64

JO - Materials and Design

JF - Materials and Design

ER -