New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

Alexandra Lex; Georg Trimmel; Wolfgang Kern; Peter Pacher; Robert Schennach; Oliver Werzer; Roland Resel; Egbert Zojer; Georg Koller; Quan Shen; Gregor Hlawacek; Christian Teichert

New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

Alexandra Lex, Georg Trimmel, Wolfgang Kern, Peter Pacher, Robert Schennach, Oliver Werzer, Roland Resel, Egbert Zojer, Georg Koller, Quan Shen, Gregor Hlawacek, Christian Teichert

Chair of Chemistry of Polymeric Materials (231)

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers
Original language	English
Publication status	Published - 2007
Event	E-MRS - Strasbourg, France Duration: 27 May 2007 → 31 May 2007

Conference

Conference	E-MRS
Country/Territory	France
City	Strasbourg
Period	27/05/07 → 31/05/07

Cite this

@conference{236c759b3c7443039dbd6e81b6c04436,

title = "New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers",

author = "Alexandra Lex and Georg Trimmel and Wolfgang Kern and Peter Pacher and Robert Schennach and Oliver Werzer and Roland Resel and Egbert Zojer and Georg Koller and Quan Shen and Gregor Hlawacek and Christian Teichert",

year = "2007",

language = "English",

note = "E-MRS ; Conference date: 27-05-2007 Through 31-05-2007",

}

TY - CONF

T1 - New Photosensitive Silane Molecules for Photochemical Patterning of Thin Layers

AU - Lex, Alexandra

AU - Trimmel, Georg

AU - Kern, Wolfgang

AU - Pacher, Peter

AU - Schennach, Robert

AU - Werzer, Oliver

AU - Resel, Roland

AU - Zojer, Egbert

AU - Koller, Georg

AU - Shen, Quan

AU - Hlawacek, Gregor

AU - Teichert, Christian

PY - 2007

Y1 - 2007

M3 - Poster

T2 - E-MRS

Y2 - 27 May 2007 through 31 May 2007

ER -