Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

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6 Citations (Scopus)

Original language	English
Pages (from-to)	021513-1-021513-5
Journal	Journal of vacuum science & technology / A (JVST)
Volume	36
DOIs	https://doi.org/10.1116/1.5009289
Publication status	Published - 2018

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@article{1716c458c49b4e2a9e9e88eb91db28ed,

title = "Oxidation and wet etching behavior of sputtered Mo-Ti-Al films",

author = "Tanja J{\"o}rg and Hofer-Roblyek, \{Anna Maria\} and Harald K{\"o}stenbauer and J{\"o}rg Winkler and Christian Mitterer",

year = "2018",

doi = "10.1116/1.5009289",

language = "English",

volume = "36",

pages = "021513--1--021513--5",

journal = "Journal of vacuum science \& technology / A (JVST)",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

}

TY - JOUR

T1 - Oxidation and wet etching behavior of sputtered Mo-Ti-Al films

AU - Jörg, Tanja

AU - Hofer-Roblyek, Anna Maria

AU - Köstenbauer, Harald

AU - Winkler, Jörg

AU - Mitterer, Christian

PY - 2018

Y1 - 2018

U2 - 10.1116/1.5009289

DO - 10.1116/1.5009289

M3 - Article

SN - 0734-2101

VL - 36

SP - 021513-1-021513-5

JO - Journal of vacuum science & technology / A (JVST)

JF - Journal of vacuum science & technology / A (JVST)

ER -