Oxidation behavior of arc evaporated Al-Cr-Si-N thin films

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Translated title of the contribution	Oxidation behavior of arc evaporated Al-Cr-Si-N thin films
Original language	English
Pages (from-to)	061501-1-061501-6
Journal	Journal of vacuum science & technology / A (JVST)
Volume	30
Publication status	Published - 2012

Cite this

@article{01be233d20944ef8af23639a6abd50bb,

title = "Oxidation behavior of arc evaporated Al-Cr-Si-N thin films",

author = "Christian Tritremmel and Rostislav Daniel and Christian Mitterer and Mayrhofer, \{Paul Heinz\} and Markus Lechthaler and Peter Polcik",

year = "2012",

language = "English",

volume = "30",

pages = "061501--1--061501--6",

journal = "Journal of vacuum science \& technology / A (JVST)",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

}

TY - JOUR

T1 - Oxidation behavior of arc evaporated Al-Cr-Si-N thin films

AU - Tritremmel, Christian

AU - Daniel, Rostislav

AU - Mitterer, Christian

AU - Mayrhofer, Paul Heinz

AU - Lechthaler, Markus

AU - Polcik, Peter

PY - 2012

Y1 - 2012

M3 - Article

SN - 0734-2101

VL - 30

SP - 061501-1-061501-6

JO - Journal of vacuum science & technology / A (JVST)

JF - Journal of vacuum science & technology / A (JVST)

ER -