Oxygen impurity related hardening mechanisms of Ti-Al-N thin films

Helmut Riedl, Christian Koller, Richard Rachbauer, S. Kolozsvari, Francisca Mendez Martin, P.H. Mayrhofer

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	Oxygen impurity related hardening mechanisms of Ti-Al-N thin films
Original language	English
Publication status	Published - 2014
Event	14th International Conference on Plasma Surface Engineering - Garmisch Partenkirchen, Germany Duration: 15 Sept 2014 → 19 Sept 2014

Conference	14th International Conference on Plasma Surface Engineering
Country/Territory	Germany
City	Garmisch Partenkirchen
Period	15/09/14 → 19/09/14

Cite this

@conference{ca30158da7d14d1f9ef02be9443db363,

title = "Oxygen impurity related hardening mechanisms of Ti-Al-N thin films",

author = "Helmut Riedl and Christian Koller and Richard Rachbauer and S. Kolozsvari and {Mendez Martin}, Francisca and P.H. Mayrhofer",

year = "2014",

language = "English",

note = "14th International Conference on Plasma Surface Engineering ; Conference date: 15-09-2014 Through 19-09-2014",

}

TY - CONF

T1 - Oxygen impurity related hardening mechanisms of Ti-Al-N thin films

AU - Riedl, Helmut

AU - Koller, Christian

AU - Rachbauer, Richard

AU - Kolozsvari, S.

AU - Mendez Martin, Francisca

AU - Mayrhofer, P.H.

PY - 2014

Y1 - 2014

M3 - Poster

T2 - 14th International Conference on Plasma Surface Engineering

Y2 - 15 September 2014 through 19 September 2014

ER -