Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy

Quan Shen; Andreas Pavitschitz; Gregor Hlawacek; Christian Teichert; Matthias Edler; Simone Radl; Thomas Grießer; Alexandra Lex; Thomas Höfler; Georg Trimmel; Wolfgang Kern

Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy

Quan Shen, Andreas Pavitschitz, Gregor Hlawacek, Christian Teichert, Matthias Edler, Simone Radl, Thomas Grießer, Alexandra Lex, Thomas Höfler, Georg Trimmel, Wolfgang Kern

Chair of Chemistry of Polymeric Materials (231)

Research output: Contribution to conference › Poster › Research › peer-review

Translated title of the contribution	Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy
Original language	English
Publication status	Published - 2011
Event	MRS Spring Meeting April 25-29 2011 San Francisco - San Francisco, United States Duration: 25 Apr 2011 → 29 Apr 2011

Conference

Conference	MRS Spring Meeting April 25-29 2011 San Francisco
Country/Territory	United States
City	San Francisco
Period	25/04/11 → 29/04/11

Cite this

Shen, Q., Pavitschitz, A., Hlawacek, G., Teichert, C., Edler, M., Radl, S., Grießer, T., Lex, A., Höfler, T., Trimmel, G., & Kern, W. (2011). Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy. Poster session presented at MRS Spring Meeting April 25-29 2011 San Francisco, San Francisco, California, United States.

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title = "Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy",

author = "Quan Shen and Andreas Pavitschitz and Gregor Hlawacek and Christian Teichert and Matthias Edler and Simone Radl and Thomas Grie{\ss}er and Alexandra Lex and Thomas H{\"o}fler and Georg Trimmel and Wolfgang Kern",

year = "2011",

language = "English",

note = "MRS Spring Meeting April 25-29 2011 San Francisco ; Conference date: 25-04-2011 Through 29-04-2011",

}

Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy. / Shen, Quan; Pavitschitz, Andreas; Hlawacek, Gregor et al.
2011. Poster session presented at MRS Spring Meeting April 25-29 2011 San Francisco, San Francisco, California, United States.

Research output: Contribution to conference › Poster › Research › peer-review

TY - CONF

T1 - Patterned Photoreactive Surface Layers Characterized by Friction Force Microscopy and Conductive Atomic-Force Microscopy

AU - Shen, Quan

AU - Pavitschitz, Andreas

AU - Hlawacek, Gregor

AU - Teichert, Christian

AU - Edler, Matthias

AU - Radl, Simone

AU - Grießer, Thomas

AU - Lex, Alexandra

AU - Höfler, Thomas

AU - Trimmel, Georg

AU - Kern, Wolfgang

PY - 2011

Y1 - 2011

M3 - Poster

T2 - MRS Spring Meeting April 25-29 2011 San Francisco

Y2 - 25 April 2011 through 29 April 2011

ER -