Translated title of the contribution | Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications |
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Original language | English |
Pages (from-to) | 717-727 |
Number of pages | 11 |
Journal | Cellulose |
Volume | Volume 22 |
Issue number | Issue 1 |
DOIs | |
Publication status | Published - 16 Oct 2014 |
Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
Archim Wolfberger, Andreas Petritz, A. Fian, Jakob Herka, V. Schmidt, B. Stadlober, Rupert Kargl, Stefan Spirk, Thomas Grießer
Research output: Contribution to journal › Article › Research › peer-review
37
Citations
(Scopus)