Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications

Archim Wolfberger, Andreas Petritz, A. Fian, Jakob Herka, V. Schmidt, B. Stadlober, Rupert Kargl, Stefan Spirk, Thomas Grießer

Research output: Contribution to journalArticleResearchpeer-review

37 Citations (Scopus)
Translated title of the contributionPhotolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
Original languageEnglish
Pages (from-to)717-727
Number of pages11
JournalCellulose
VolumeVolume 22
Issue numberIssue 1
DOIs
Publication statusPublished - 16 Oct 2014

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