Skip to main navigation Skip to search Skip to main content

Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications

  • Archim Wolfberger
  • , Andreas Petritz
  • , A. Fian
  • , Jakob Herka
  • , V. Schmidt
  • , B. Stadlober
  • , Rupert Kargl
  • , Stefan Spirk
  • , Thomas Grießer

Research output: Contribution to journalArticleResearchpeer-review

37 Citations (Scopus)
Translated title of the contributionPhotolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
Original languageEnglish
Pages (from-to)717-727
Number of pages11
JournalCellulose
VolumeVolume 22
Issue numberIssue 1
DOIs
Publication statusPublished - 16 Oct 2014

Cite this