Abstract
The aim of the present thesis was the physical vapour deposition (PVD) process development and investigation of the film structure/properties relationships of room-temperature (
Translated title of the contribution | Raum-Temperatur Abscheidung von DLC-Schichten mit einer Ionenstrahlmethode, reaktivem Magnetronkathodenzerstäuben und gepulster Laser Dampfphasenabscheidung: Prozess-Design, Schichtstruktur und Schichteigenschaften |
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Original language | English |
Qualification | Dr.mont. |
Supervisors/Advisors |
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Publication status | Published - 2009 |
Bibliographical note
no embargoKeywords
- Amorphous Carbon Films (a-C)
- Physical Vapour Deposition (PVD)
- Magnetron Sputtering
- Pulsed Laser Deposition (PLD)
- Raman Spectroscopy