Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

Jinbo Pang; Rafael G. Mendes; Pawel S. Wrobel; Michal D. Wlodarski; Huy Quang Ta; Liang Zhao; Lars Giebeler; Barbara Trzebicka; Thomas Gemming; Lei Fu; Zhongfan Liu; Jürgen Eckert; Alicja Bachmatiuk; Mark H. Ruemmeli

doi:10.1021/acsnano.6b08069

Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

Jinbo Pang
, Rafael G. Mendes
, Pawel S. Wrobel
, Michal D. Wlodarski
, Huy Quang Ta
, Liang Zhao
, Lars Giebeler
, Barbara Trzebicka
, Thomas Gemming
, Lei Fu
, Zhongfan Liu
, Jürgen Eckert
, Alicja Bachmatiuk
, Mark H. Ruemmeli

Chair of Materials Physics (430)

Leibniz Institute for Solid State and Materials Research, Dresden
Polish Academy of Sciences
Soochow University
Wuhan University
Erich Schmid Institute of Materials Science

Research output: Contribution to journal › Article › Research › peer-review

83 Citations (Scopus)

Original language	English
Pages (from-to)	1946-1956
Number of pages	11
Journal	ACS nano
Volume	11.2017
Issue number	2
DOIs	https://doi.org/10.1021/acsnano.6b08069
Publication status	Published - Jan 2017

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10.1021/acsnano.6b08069

Cite this

Pang, J., Mendes, R. G., Wrobel, P. S., Wlodarski, M. D., Ta, H. Q., Zhao, L., Giebeler, L., Trzebicka, B., Gemming, T., Fu, L., Liu, Z., Eckert, J., Bachmatiuk, A., & Ruemmeli, M. H. (2017). Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition. ACS nano, 11.2017(2), 1946-1956. https://doi.org/10.1021/acsnano.6b08069

@article{c4edfd3e1149417790d69c8fc24cb6ac,

title = "Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition",

author = "Jinbo Pang and Mendes, \{Rafael G.\} and Wrobel, \{Pawel S.\} and Wlodarski, \{Michal D.\} and Ta, \{Huy Quang\} and Liang Zhao and Lars Giebeler and Barbara Trzebicka and Thomas Gemming and Lei Fu and Zhongfan Liu and J{\"u}rgen Eckert and Alicja Bachmatiuk and Ruemmeli, \{Mark H.\}",

year = "2017",

month = jan,

doi = "10.1021/acsnano.6b08069",

language = "English",

volume = "11.2017",

pages = "1946--1956",

journal = "ACS nano",

issn = "1936-0851",

publisher = "American Chemical Society",

number = "2",

}

Pang, J, Mendes, RG, Wrobel, PS, Wlodarski, MD, Ta, HQ, Zhao, L, Giebeler, L, Trzebicka, B, Gemming, T, Fu, L, Liu, Z, Eckert, J, Bachmatiuk, A & Ruemmeli, MH 2017, 'Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition', ACS nano, vol. 11.2017, no. 2, pp. 1946-1956. https://doi.org/10.1021/acsnano.6b08069

TY - JOUR

T1 - Self-Terminating Confinement Approach for Large-Area Uniform Monolayer Graphene Directly over Si/SiOX by Chemical Vapor Deposition

AU - Pang, Jinbo

AU - Mendes, Rafael G.

AU - Wrobel, Pawel S.

AU - Wlodarski, Michal D.

AU - Ta, Huy Quang

AU - Zhao, Liang

AU - Giebeler, Lars

AU - Trzebicka, Barbara

AU - Gemming, Thomas

AU - Fu, Lei

AU - Liu, Zhongfan

AU - Eckert, Jürgen

AU - Bachmatiuk, Alicja

AU - Ruemmeli, Mark H.

PY - 2017/1

Y1 - 2017/1

U2 - 10.1021/acsnano.6b08069

DO - 10.1021/acsnano.6b08069

M3 - Article

SN - 1936-0851

VL - 11.2017

SP - 1946

EP - 1956

JO - ACS nano

JF - ACS nano

IS - 2

ER -